Computer simulation of ion implantation with visual observation of the implantation profiles

摘要

In the present work CASWIN-D-code is described, which allows visually observe of the surface composition change. The code is more convenient for investigation of ion implantation processes due to the possibility for obtaining the visual results for their immediate analysis. The code is very simple in use and universal for wide range of multicomponent materials. We have performed the calculation of B{sub}4C and GaAs implantation with He{sup}+, Ar{sup}+ and Ba{sup}+ ions by means of CASWIN-code. The correctness of program and adequacy of used calculation model is confirmed by the comparison with experiment that shows the good agreement.