Extension of the Source Lifetime in HC Ion Implanter with Dedicated Species

摘要

Ion source life is one of the critical components in the equation that defines productivity, tool availability and overall Cost of Ownership (CoO). In advanced logic devices, the majority of the traditional conductive doping steps such as source drain (SD) and source drain extension (SDE) are now done in-situ during epitaxy. As a result, running mixed species (B/BF2/P/As etc) which inherently helps the source life is becoming less of an option. Operating the source with the same species for an extended time impacts source life. In this paper we present results for a co-gas (Inert + H2) approach [1] in combination with hardware modifications to extend source lifetime for dedicated species operation. Lifetimes of different species have been doubled or even tripled for some species as depicted in the Fig.1. below.