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Graphane/fully hydrogenated h-BN bilayer: Marvellous dihydrogen bonding and effective band structure engineering

机译:石墨烷/完全氢化的h-BN双层:奇妙的二氢键结合和有效的能带结构工程

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In this work, density functional theory (DFT) computations with van der Waals (vdW) corrections were performed to investigate the dihydrogen bondings and their effects on the electronic band structures of graphane/fully hydrogenated h-BN (G/fHBN) bilayers. The type of dihydrogen bonding (C-H···H-B or C-H···H-N) defined the conformation and stability of G/fHBN bilayer, leads to significant band structure modifications of the nanosystems. Interestingly, the bilayer combined by C-H···H-B bilayers has an energy gap (~1.2 eV) much lower than those of individual building blocks graphane and fHBN. Especially, changing the direction and strength of external electric field can effectively tune the band gap of G/fHBN bilayer, and correspondingly cause a semiconductor-metal transition. These findings offer new opportunities for developing electronic and opto-electronic devices based on G/fHBN bilayer, and inspire more endeavor in the usage of weak interactions for band structure engineering.
机译:在这项工作中,进行了范德华(vdW)校正的密度泛函理论(DFT)计算,以研究二氢键及其对石墨烷/完全氢化的h-BN(G / fHBN)双层电子带结构的影响。二氢键的类型(C-H···H-B或C-H···H-N)定义了G / fHBN双层的构象和稳定性,导致纳米系统的能带结构发生重大变化。有趣的是,由C-H···H-B双层组合而成的双层的能隙(〜1.2 eV)远低于单个构建基石墨烯和fHBN的能隙。特别地,改变外部电场的方向和强度可以有效地调谐G / fHBN双层的带隙,并相应地引起半导体-金属跃迁。这些发现为开发基于G / fHBN双层的电子和光电设备提供了新的机会,并激发了人们在将弱相互作用用于能带结构工程中的更多努力。

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