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Atomic layer deposited TiO2 protects highly porous ceramic bone scaffolds from grain boundary corrosion

机译:原子层沉积的TiO2保护高度多孔的陶瓷骨支架免受晶界腐蚀

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Introduction: Corrosion in ceramics occurs preferentially at high energy sites such as grain boundaries (GB) and GB corrosion is a well-known phenomenon for polycrystalline oxide ceramics. when highly porous ceramic materials such as bone scaffolds with large surface-to-volume ratios are exposed to corrosive environment, GB corrosion can have a particularly detrimental impact on the mechanical properties of the scaffold. This study aims to investigate the suitability of atomic layer deposition (ALD) of TiO2 thin films to protect a macro-porous TiO2 scaffold from GB corrosion and maintain its mechanical properties in physiologically low pH conditions. Two different deposition temperatures were chosen to assess the effect of film structure on the barrier properties of the deposited layers. Materials and Methods: TiO2 thin films were deposited at 150°C and 250 °C on the surface of highly porous TiO2 scaffolds using the chloride-water ALD process. The ALD films were characterised by scanning electron and atomic force microscopy, x-ray diffraction, and ellipsometry. The compressive strength of the ALD-coated scaffolds was tested following up to 28 d exposure to corrosive medium (1mM HCl). Results and Discussion: Although the ALD coatings deposited at 150 °C were mostly characterised as having amorphous structure, some randomly formed anatase crystallites were observed to protrude through the amorphous film as shown in Figure 1 A. Films deposited at 250 °C had anatase crystal structure and were composed of densely packed grains with an average diameter of 31 ± 6 nm was (Figure 1B). The thicknesses of the amorphous and anatase coatings were 26 ± 1 and 22 ± 2 nm, respectively, and these thicknesses were not altered by 28 d exposure to 1mM HCl as measured by ellipsometry. In addition, strong adhesion between the coating and substrate was observed with no cracking or delamination upon fracture of the scaffold struts. Figure 1: Atomic force micrographs merged from height and amplitude scans (10×10 μm2) and height profiles in cross-section (below) for TiO2 deposited at 150 °C (A) and 250 °C (B) with high resolution scans (300×300 nm2) as 3D illustrations. After 7 and 28 days immersion into 1 mM HCl, a significant reduction in the compressive strength of the uncoated scaffolds was observed due to dissolution of siliceous GB phase, whereas both ALD coated scaffolds maintained the initial strength (Figure 2). This indicates that GB corrosion in highly porous scaffolds is mitigated under acidic conditions up to an exposure period of 28 days. In contrast to the unchanged strength of amorphous coated scaffolds, a slight decrease for the anatase coated scaffolds to 94 % of the initial strength after 28 days immersion was observed. Figure 2: Compressive strength of non-coated and ALD coated scaffolds prior and after immersion into 1 mM HCl for 7 and 28 days (n=10). Conclusions: GB corrosion in highly porous TiO2 scaffolds was successfully diminished by atomic layer deposition of both amorphous and anatase T1O2. The compressive strength of ALD coated scaffolds was maintained in physiologically low pH conditions up to 28 days. Amorphous T1O2 films offered excellent protection against GB corrosion, whereas anatase coated scaffolds with nano-sized grains may allow for improved osteoconduction in vitro and in vivo.
机译:简介:陶瓷腐蚀优先发生在高能位点,例如晶界(GB),而GB腐蚀是多晶氧化物陶瓷的一种众所周知的现象。当高度多孔的陶瓷材料(例如具有大的体积比的骨骼支架)暴露于腐蚀性环境时,GB腐蚀会对支架的机械性能产生特别不利的影响。这项研究旨在调查TiO2薄膜原子层沉积(ALD)的适用性,以保护大孔TiO2支架免受GB腐蚀,并在生理低pH条件下保持其机械性能。选择两种不同的沉积温度以评估膜结构对沉积层的阻挡性能的影响。材料和方法:TiO2薄膜是在150°C和250°C的条件下使用氯化物-水ALD工艺在高度多孔的TiO2支架表面沉积的。 ALD膜通过扫描电子和原子力显微镜,X射线衍射和椭圆光度法表征。在暴露于腐蚀性介质(1mM HCl)长达28 d后,测试了ALD涂层支架的抗压强度。结果与讨论:尽管在150°C下沉积的ALD涂层大多具有非晶结构,但观察到一些随机形成的锐钛矿晶体穿过非晶膜,如图1 A所示。在250°C沉积的膜具有锐钛矿晶体。结构,由密集堆积的晶粒组成,平均直径为31±6 nm(图1B)。无定形涂层和锐钛矿涂层的厚度分别为26±1和22±2 nm,并且通过椭圆偏振法测量,暴露于1mM HCl中28 d后这些厚度没有改变。另外,观察到涂层和基材之间的强粘附力,而在支架支柱断裂时没有开裂或分层。图1:通过高分辨率扫描(150)(A)和250°C(B)沉积的TiO2的高度和振幅扫描(10×10μm2)和横截面的高度轮廓(下)合并的原子力显微照片(下图) 300×300 nm2)作为3D插图。浸入1 mM HCl中7天和28天后,由于硅质GB相的溶解,未涂层支架的抗压强度显着降低,而两种ALD涂层支架均保持了初始强度(图2)。这表明在酸性条件下长达28天的暴露时间可以缓解高多孔性支架中的GB腐蚀。与无定形涂覆的支架的强度没有变化相比,锐钛矿型涂覆的支架在浸入28天后略微下降到初始强度的94%。图2:将未涂覆和ALD涂覆的支架浸入1 mM HCl中之前和之后的压缩强度,分别为7天和28天(n = 10)。结论:通过无定形和锐钛矿型TiO 2的原子层沉积,成功地减少了高多孔性TiO2支架中的GB腐蚀。 ALD涂覆的支架的抗压强度在生理性低pH条件下保持长达28天。非晶态的TiO 2薄膜提供了出色的抗GB腐蚀的保护作用,而具有纳米尺寸晶粒的锐钛矿涂层支架可以改善体外和体内的骨传导。

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