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Demonstration of 20µm pitch micro-vias by excimer laser ablation in ultra-thin dry-film polymer dielectrics for multi-layer RDL on glass interposers

机译:用准分子激光烧蚀在玻璃中介层上多层RDL的超薄干膜聚合物电介质中演示了20μm节距的微通孔

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This paper describes the first demonstration of 8-10μm diameter micro-vias at 20μm pitch in ultra-thin dry-film polymer dielectrics to achieve high-density and low-cost redistribution layers (RDL) on panel-based glass and organic interposers. A polymer dielectric dry-film, ZEONIF ZS100, at 10μm thickness was double side laminated on thin and low CTE glass and organic substrates. Micro-via arrays at 20μm pitch were formed by 248nm KrF excimer laser ablation using mask projection scanning, and metallized by a semi-additive process (SAP) using electroless and electrolytic copper plating, with no chemical-mechanical polishing to form fully filled via structures. Fully-filled micro-vias at 20um were achieved using processes scalable to large panels for low-cost and high-density 2.5D and 3D interposers.
机译:本文介绍了在超薄干膜聚合物电介质中为20μm间距的8-10μm直径微通孔的第一次演示,以实现基于面板的玻璃和有机插入器上的高密度和低成本的再分配层(RDL)。聚合物介电干膜Zeonif ZS100,厚度为10μm,是在薄和低CTE玻璃和有机基材上层叠的双侧。通过使用掩模投影扫描的248nm KRF准分子激光烧蚀,通过使用无电镀和电解镀铜金属化的微通孔阵列由248nm KRF准分子激光烧蚀形成,并通过无电解镀铜金属化,没有化学机械抛光以形成完全填充的通过结构。 。使用用于低成本和高密度2.5D和3D插入的大面板的过程实现了20um的完全填充的微通孔。

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