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An accurate on-chip design estimation for mitigating EMI effects in a large-scale integration chip

机译:精确的片上设计估计,可减轻大规模集成芯片中的EMI影响

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Inside an electronic product with high-speed interfaces, a lot of technological effort is required for neutralizing mutual electromagnetic interference (EMI) between adjacent electronic components. Thus, it is necessary to adopt an EMI-aware design to maintain high-performance features by avoiding possible EMI causes in a large-scale integration (LSI) chip. In this work, we analyzed IC-level EMI causes for improving on-chip EMI perspectives by characterizing composing channel impedance with a view to the whole system. A test channel for characterizing system-level impedance properties consists of power/ground nets of on-chip metal layers, a chip-on film (CoF), and a printed circuit board (PCB). Specifically, we compared two test samples with different features. One (sample 1) has a 0.8nF on-chip decoupling capacitor, only horizontal Vdd-Vss pairing layout for power interconnects, and 0.2T clock shift scheme from data edge position. The other (sample 2) has a 1.5nF on-chip decoupling capacitor, both vertical and horizontal Vdd-Vss pairing layout for confining an EM field, and 0.5T clock shift scheme for frequency spreading effect. Using simulation results and frequency domain analysis, the impedance was found to be 1.3 Ohm to 0.9 Ohm at a specific noise frequency of interest (132MHz) as the decoupling capacitance increases from 0.8 nF to 1.5nF. In comparison, the performance of EMI properties in sample 2 was found to be improved by 6.0dB when compared to sample1. Specifically, this improvement turned out to be affected by 3.2dB due to increasing on-chip decoupling capacitance of 0.7dB due to a shielding effect on the power/ground interconnect layout of an added metal layer and 1.6dB due to changing the scheme of a clock timing transition. In the simulation-based estimation, this 5.5dB improvement was demonstrated to agree with the near-field measurement with a 6.0dB improvement. Consequently, our approach to analyze on-chip EMI effects is helpful to understand compl- x electromagnetic behaviors in an LSI chip and it is also expected to be applicable in suppressing complex EMI causes for leveraging on-chip EMI performance.
机译:在具有高速接口的电子产品内部,需要大量的技术工作来抵消相邻电子组件之间的相互电磁干扰(EMI)。因此,有必要采用EMI感知设计来通过避免大规模集成(LSI)芯片中可能的EMI原因来保持高性能。在这项工作中,我们分析了IC级别EMI的原因,通过表征通道阻抗来改善整个系统的角度,从而改善了片上EMI的观点。表征系统级阻抗特性的测试通道包括片上金属层的电源/接地网,片上膜(CoF)和印刷电路板(PCB)。具体来说,我们比较了两个具有不同功能的测试样本。一个(样本1)具有一个0.8nF的片上去耦电容器,仅用于电源互连的水平Vdd-Vss配对布局以及从数据边沿位置移出0.2T时钟的方案。另一个(样本2)具有一个1.5nF的片上去耦电容器,垂直和水平Vdd-Vss配对布局(用于限制EM场)和0.5T时钟移位方案,以实现扩频效果。使用仿真结果和频域分析,当去耦电容从0.8 nF增加到1.5nF时,在特定的目标噪声频率(132MHz)下,阻抗为1.3 Ohm至0.9 Ohm。相比之下,与样本1相比,发现样本2的EMI性能提高了6.0dB。具体而言,由于对附加金属层的电源/接地互连布局的屏蔽效应使芯片上的去耦电容增加了0.7dB,而由于将片上去耦电容提高了0.7dB,因此改进受到了3.2dB的影响;而由于改变了a的方案,导致了1.6dB的改进。时钟时序转换。在基于仿真的估计中,这种5.5dB的改善被证明与6.0dB改善的近场测量相吻合。因此,我们用于分析片上EMI效应的方法有助于理解LSI芯片中的复杂电磁行为,并且有望将其应用于抑制复杂的EMI原因以利用片上EMI性能。

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