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The characterization of Al2O3 and TiO2 antireflection coatings with a novel X-Ray reflectivity method and other experimental techniques

机译:新型X射线反射率法和其他实验技术表征Al2O3和TiO2减反射膜

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AlO/TiO/AlO multilayer antireflection stacks used for broadband antireflection coatings and TiO and AlO single layers were characterized by a novel combination of an X-ray reflectivity layer extraction algorithm, X-ray reflectivity simulations, spectroscopic ellipsometry, broadband optical reflectance, glancing incidence X-ray diffraction and transmission electron microscopy. Single-layer TiO and AlO antireflection coatings were also measured by glancing incidence small angle X-ray scattering. Layer thicknesses and surface and interface roughnesses with a few Å precision, densities normalized to bulk densities with less than one percent uncertainty, and differences in pore-induced scattering were assessed. These parameters are key to understanding the role of deposition and processing conditions on the performance of broadband antireflection coatings. Additionally, the effect of air annealing at 400 °C for 10 min and 40 min on the structural and optical properties of single-layer TiO and AlO antireflection coatings was also revealed.
机译:用于宽带抗反射涂层以及TiO和AlO单层的AlO / TiO / AlO多层抗反射叠层的特征在于,X射线反射率层提取算法,X射线反射率模拟,光谱椭圆偏振法,宽带光学反射率,掠射发生率的新颖结合X射线衍射和透射电子显微镜。还通过掠入射小角度X射线散射来测量单层TiO和AlO抗反射涂层。评估了具有几Å精度的层厚度以及表面和界面粗糙度,将密度归一化为体积密度(不确定度小于1%),并评估了孔隙引起的散射差异。这些参数是了解沉积和加工条件对宽带减反射涂层性能的作用的关键。此外,还揭示了在400°C空气退火10分钟和40分钟对单层TiO和AlO抗反射涂层的结构和光学性能的影响。

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