LOW COST WAX MASKING TECHNIQUE FOR ELECTROPLATED METALLIZATION FOR SOLAR CELLS APPLICATION

摘要

A new approach based on the development of a new low-cost masking material is presented. The new masking material based on a low-cost wax composition able to withstand wet hot chemical treatment at up to 100 °C. The developed wax composition costs 10 times less than photoresist and can be taken into consideration as an industrial masking process for solar cell for the front copper metallization process. In this work, applying and removal procedures of wax mask are discussed. The applying procedure consists of rolling of wax film and further patterning using laser ablation. Removal procedures are two: thermal and chemical. The procedures are investigated using optical microscopy, reflectance spectroscopy and lifetime measurements. Finally, the proposed approach has potential to enable front-side electroplated metallization at low cost.