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Zero-valent Au, Cu and Sn Intercalation into GeS Nanoribbons: Tailoring Ultrafast Photoconductive Response

机译:零价Au,Cu和Sn插入Ges Nanoribbons:剪裁超快光电导光

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Germanium sulfide (GeS) is a 2D semiconductor with high carrier mobility and a moderate band gap (~1.5 eV for multilayer crystals), which holds promise for high-speed optoelectronics and energy conversion. Here, we use time-resolved THz spectroscopy to investigate how intercalation of Au, Cu, and Sn impacts the photoexcited carrier dynamics and transient photoconductivity of GeS nanoribbons. We find that zero-valent metals affect the photoexcited carrier lifetime and mobility in different ways. Intercalation of GeS with Cu reduces the lifetime of carriers from ~ 120 ps to 60 ps, while Au and Sn intercalation do not. At the same time, intercalation with Cu, Sn and Au significantly enhances the scattering time of photoexcited carriers (~120 fs vs ~65 fs without intercalation), highlighting the potential of zero-valent metal intercalation as a tool for engineering the optoelectronic properties of GeS nanostructures for application in high-speed electronic devices.
机译:硫化锗(GES)是具有高载流动性和中等带隙(用于多层晶体的〜1.5eV)的2D半导体,其拥有高速光电子和能量转换的承担。在这里,我们使用时间分辨的THz光谱检查Au,Cu和Sn的插入如何影响Ges Nanoribbons的运动透射载波动力学和瞬态光电导性。我们发现零价金属以不同的方式影响光缩的载体寿命和移动性。 GES与Cu的插入将载体的寿命从〜120 PE减少到60 ps,而Au和Sn插入则不会。同时,与Cu,Sn和Au的嵌入显着增强了光屏蔽载体的散射时间(〜120 fs与65 fs而没有插入),突出了零价金属嵌入的潜力作为工程工程的光电性质GES纳米结构用于高速电子设备的应用。

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