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Etch-A-Sketch filter

机译:蚀刻蚀刻过滤器

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This paper demonstrates an “Etch-A-Sketch” filter on a Z-cut lithium niobate (LN) thin-film. The filter consists of two resonators coupled by a reconfigurable phononic crystal that can be programmed by AFM-based post-release piezoelectric domain engineering. Specifically, we demonstrated a band-pass filter at 553MHz with 8.6MHz 3dB bandwidth (BW). Then, we “Etch-A-Sketch” periodically domain inverted patterns on the coupling element which changes the coupling impedance, and reduces the filter BW by 4.6%. This method only requires 80V (magnitude) to achieve domain inversion which is 100x lower than that required for bulk LN, and no DC bias voltage is required during RF operation.
机译:本文演示了在Z切割铌酸锂(LN)薄膜上的“蚀刻A-Sketch”滤光片。该滤波器由两个谐振器组成,这些谐振器由可重配置的声子晶体耦合,该声子晶体可通过基于AFM的释放后压电域工程进行编程。具体来说,我们展示了一个553MHz带8.6MHz 3dB带宽(BW)的带通滤波器。然后,我们在蚀刻元件上周期性地“蚀刻-蚀刻”,从而改变了耦合阻抗,并使滤波器的带宽降低了4.6%。此方法仅需要80V(幅度)即可实现域反转,这比批量LN所需的域反转低100倍,并且在RF操作期间不需要直流偏置电压。

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