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Research on the microstructure and shearing property of microbumps with one Sn grain for high density solder interconnects

机译:高密度焊料互连用一锡晶粒微凸点的组织和剪切性能研究

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In order to meet the requirement of the higher density interconnects, the volume size of the solder microbumps continues to be reduced. In the present research, the microstructure of the microbumps with a diameter of 40μm was studied using Electron Backscatter Diffraction (EBSD). When the microbumps are smaller than a Sn grain in size, only one Sn grain is found to be contained in the microbumps. Shearing tests were carried out to study the mechanical behavior and the fracture mode. The strain rate sensitivity exponent of the microbump with one Sn grain is about 0.1. And a typical sliding fracture of the Sn grain is observed at different shearing speeds, which is different from the usual microvoids accumulation fracture displayed by BGA solder joints. The research findings are useful to assess the reliability of the high density solder interconnects, such as fine pitch flip chip, 3D-TSV, copper pillar bumps, and so on.
机译:为了满足更高密度互连的要求,焊料微型凸块的体积尺寸不断减小。在本研究中,使用电子背散射衍射(EBSD)研究了直径为40μm的微型凸点的微观结构。当微型凸块的尺寸小于Sn晶粒时,发现微型凸块中仅包含一个Sn晶粒。进行了剪切试验以研究机械性能和断裂模式。具有一个Sn晶粒的微凸点的应变率灵敏度指数约为0.1。并且在不同的剪切速度下观察到典型的Sn晶粒滑动断裂,这与BGA焊点显示的常见的微孔累积断裂不同。研究结果对于评估高密度焊料互连的可靠性很有用,例如细间距倒装芯片,3D-TSV,铜柱凸点等。

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