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Fabrication HfOx nanopatterns by atomic force microscopy lithography

机译：用原子力显微镜光刻制备HFO X / INF>纳米图

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The HfOx nanopatterns are fabricated with the aid of atomic force microscopy (AFM), which shows the great capacity of the local anodic oxidation (LAO) on the potential field of nano-scale device fabrications. Moreover, the kinetic mechanisms of the anodic HfOx growth are discussed in detail.

机译：借助原子力显微镜（AFM）制造了HFO X / INF>纳米图案，其显示了局部阳极氧化（LAO）对纳米级器件制造的潜在领域的大容量。此外，详细讨论了阳极HFO X / IM>生长的动力学机制。

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《IEEE International Conference on Electron Devices and Solid-State Circuits 》|2008年||共4页
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An J.; Xue K.; Xu J. B.;
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中图分类 TN43-53;
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5. Fabrication HfOx nanopatterns by atomic force microscopy lithography [C] . An J., Xue K., Xu J. B. IEEE International Conference on Electron Devices and Solid-State Circuits . 2008

机译：用原子力显微镜光刻制备HFO X / INF>纳米图
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Fabrication HfOx nanopatterns by atomic force microscopy lithography

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