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AES analysis of interdiffusions in Cr/Au, Ti/Au and TiW/Au multi-layer films

机译:Cr / Au,Ti / Au和TiW / Au多层膜中相互扩散的AES分析

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To predict the reliability of gold electrode, interdiffusions in Cr/Au, Ti/Au and TiW/Au multi-layers when thermally treated were investigated by depth profiling of auger electron spectroscopy (AES). The primitive measuring results suggest that all the under-layer metals diffuse in gold layer when thermally treated and the rise of temperature enhances these diffusions. Cr and Ti accumulate at the surface of gold layer in Cr/Au and Ti/Au samples. And it seems that the introduction of W prevents these accumulations in TiW/Au sample. The measurement of nanohardness indicates that the interdiffusion of under-layer metals increase the nanohardness, while annealing decreases the nanohardness of metal films.
机译:为了预测金电极的可靠性,通过俄歇电子能谱(AES)的深度剖析研究了热处理后Cr / Au,Ti / Au和TiW / Au多层中的相互扩散。原始的测量结果表明,所有底层金属在热处理后都会扩散到金层中,而温度的升高会增强这些扩散。在Cr / Au和Ti / Au样品中,Cr和Ti积累在金层的表面。而且,W的引入似乎阻止了TiW / Au样品中的这些积累。纳米硬度的测量表明,底层金属的相互扩散增加了纳米硬度,而退火降低了金属膜的纳米硬度。

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