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Composition controlled LiCoO_2 epitaxial thin film growth by pulsed laser deposition

机译:通过脉冲激光沉积进行成分控制的LiCoO_2外延薄膜生长

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LiCoO_2 thin films were epitaxially grown by pulsed laser deposition (PLD). PLD is widely used to form complex oxide thin films due to the relatively small deviation in cationic composition between the target and the film. The deviation highly depends on the ablation laser conditions, and it greatly affects the quality of the epitaxial LiCoO_2 thin films. Furthermore, relatively lower oxygen pressure was found to result in higher quality LiCoO_2 thin films with suppressed impurity phases, although much higher oxygen pressure had been often used to avoid the formation of a lower valence state Co_3O_4 as an impurity. In other words, gas pressure also affects the composition in the case of lithium compounds, because lithium is even lighter than oxygen. The results clearly indicate that the difference in the composition between the target and the film is controllable by adjusting these parameters. In this study, we demonstrated the high-rate epitaxial growth of stoichiometric LiCoO_2 films by using a lithium-enriched target through composition control.
机译:LiCoO_2薄膜通过脉冲激光沉积(PLD)外延生长。由于靶和膜之间阳离子组成的相对较小偏差,PLD被广泛用于形成复合氧化物薄膜。该偏差高度取决于烧蚀激光条件,并且极大地影响了外延LiCoO_2薄膜的质量。此外,尽管经常使用高得多的氧压来避免形成较低价态的Co_3O_4作为杂质,但是发现相对较低的氧压可产生具有抑制的杂质相的更高质量的LiCoO_2薄膜。换句话说,在锂化合物的情况下,气压也影响组成,因为锂甚至比氧还轻。结果清楚地表明,通过调节这些参数,可以控制靶材和膜之间的组成差异。在这项研究中,我们证明了通过成分控制使用富锂靶,可以实现化学计量LiCoO_2薄膜的高速外延生长。

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