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Studies on H2O-based Al2O3 deposited on as-grown CVD graphene

机译:以生长的CVD石墨烯沉积的基于H2O的Al2O3的研究

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In this paper, graphene films were synthesized by chemical vapor deposition. Raman spectra and transmission electron microscope indicated the graphene films were few-layer. Al2O3 films were grown directly onto the surface of graphene transferred on SiO2/Si by H2O-based atomic layer deposition method. Experiments revealed that the distribution of physically adsorbed H2O molecules on the surface of graphene decided the morphology of Al2O3 film, and the O/Al ratio was close to stoichiometric condition of 1.5.
机译:本文通过化学气相沉积合成石墨烯薄膜。拉曼光谱和透射电子显微镜表明石墨烯薄膜是几层。通过H 2 O基原子层沉积方法将Al2O3薄膜直接生长到SiO 2 / Si上转移的石墨烯表面上。实验表明,石墨烯表面上的物理吸附的H2O分子分布决定了Al 2 O 3膜的形态,o / Al比接近化学计量的条件为1.5。

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