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Structural and Optical Characterization of Tin (Sn) Doped Zinc Sulfide (ZnS) Thin Film

机译:锡(Sn)掺杂锌硫化锌(ZnS)薄膜的结构和光学表征

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Zinc Sulfide (ZnS) thin film was deposited on glass substrate using chemical bath deposition technique and Tin (Sn) doping was performed by adding Tin Chloride (SnCl2) solution as Sn source. These films were further characterized by X-ray diffractometer (XRD) and UV-VIS-NIR spectrophotometer. ZnS thin film had single phase hexagonal structure and Sn doping replaces Zn atom without altering shape. Deposition temperature fixed at 70°C for 30 minutes and annealed for 15 minutes at 100°C. XRD intensity increase as the percentage of Sn doping increases, Optical properties like transmittance, dielectric constant, energy bandgap and absorbance had promising results. Transmittance in near-infrared region was greater than 83%, relatively stable absorbance of (5–11) %, energy bandgap from 3.60 eV to 3.84 eV, small fluctuation in dielectric constant and reduced refractive index. Optical bandgap and dielectric constant of ZnS thin film both have proportional relation with percentage of Tin doping.
机译:使用化学浴沉积技术在玻璃基板上沉积硫化锌(ZnS)薄膜,并通过加入氯化锡(SNCL)进行锡(SN)掺杂(SNCL 2 )sn sn源的解决方案。这些薄膜的特征在于X射线衍射仪(XRD)和UV-Vis-Nir分光光度计。 ZnS薄膜具有单相六边形结构,SN掺杂替换Zn原子而不改变形状。沉积温度固定在70℃下30分钟,并在100℃下退火15分钟。随着SN掺杂增加的百分比,XRD强度增加,透射率,介电常数,能量带隙和吸光度等光学性质具有很有希望的结果。近红外区域的透射率大于83%,吸光度相对稳定(5-11)%,从3.60eV到3.84eV的能量带隙,介电常数和折射率降低的小波动。 ZnS薄膜的光学带隙和介电常数均具有比例与锡掺杂百分比的关系。

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