Optimal NBTI degradation and PVT variation resistant device sizing in a full adder cell

摘要

Aging phenomena, on top of process variations along with temperature and supply voltage variations, translate into complex degradation effects on the required performance and yield of nanoscale circuits. The proposed paper focuses on the development of mathematically optimal circuit sizing for yield maximization on the case study of a CMOS full adder circuit. The final cell design is robust against NBTI aging effects, impact of statistical (global and mismatch) and operating variation of temperature and supply voltage. Monte Carlo analysis has been carried out to verify the estimated yields. The demonstrated technique can be extended to a library of optimally designed digital cells.