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Cold-container crystal growth of “last-to-freeze” silicon samples, and enhanced detection of metallic impurities by ICP-MS

机译:“最后冻结”的硅样品的冷容器晶体生长,并通过ICP-MS增强了对金属杂质的检测

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Inductively-coupled cold containers are used to melt silicon samples of various shapes, and the electromagnetic forces on the melt form an isolated, well-controlled last-to-freeze region where impurities in the sample are concentrated by their small segregation coefficients. Inductively-coupled plasma mass spectrographic (ICP-MS) values for impurity concentrations in the ∼0.1 g enriched region are related back to the ∼30 g original sample, providing lower limits for impurity concentrations that are below the typical ICP-MS 0.1 ppb detection limit. There is no rod or granular sample geometry restriction as with float-zone impurity concentration techniques, and no obfuscating impurity introduction from quartz crucibles or graphite hot zones.
机译:电感耦合的冷容器用于熔化各种形状的硅样品,并且熔体上的电磁力形成一个隔离的,控制良好的最后凝固区域,该区域中的样品中杂质含量低,其偏析系数小。约0.1 g富集区域中杂质浓度的电感耦合等离子体质谱(ICP-MS)值与约30 g原始样品相关,从而提供了低于典型ICP-MS 0.1 ppb检测的杂质浓度下限限制。浮球区杂质浓缩技术没有杆或粒状样品的几何形状限制,并且不会混淆石英坩埚或石墨热区引入的杂质。

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