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Multi-bandgap III-V on insulator wafer fabricated by quantum well intermixing for III-V CMOS photonics platform

机译:通过量子阱混合在III-V CMOS光子平台上制造的绝缘体晶片上的多带隙III-V

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摘要

We have investigated a fabrication procedure of a multi-bandgap III-V on insulator (III-V-OI) wafer by quantum well intermixing for active/passive integration on III-V CMOS photonics platform. We have sucessfully achieved approximately 50-nm wavelength shift in photoluminecense peak on the III-V-OI wafer by P impantation with 40 keV implant energy.
机译:我们已经研究了通过量子阱混合在III-V CMOS光子平台上进行有源/无源集成的在绝缘体(III-V-OI)晶片上的多带隙III-V的制造过程。通过用40 keV注入能量进行P注入,我们成功地在III-V-OI晶片上实现了光致发光峰的约50 nm波长偏移。

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