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A new extraction method for effective channel length on lightly doped drain MOSFET's

机译:一种新的渠道长度对轻掺杂漏极MOSFET的新提取方法

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An extraction method for an effective channel length (L/sub eff/) on lightly doped drain (LDD) MOSFETs is proposed. In the method, the L/sub eff/ is obtained by the linear extrapolation of the gate-bias-dependent L/sub eff/ to the threshold voltage. In order to clear the difference of the gate bias dependence of the L/sub eff/ among various LDD structures, the LDDs are examined with experiments and simulations. The L/sub eff/ of LDDs corresponds to the metallurgical length. It is shown that MOSFET parameters can be reasonably characterized when the L/sub eff/ obtained by the method is used.
机译:提出了一种用于轻掺杂漏极(LDD)MOSFET上有效通道长度(L / SUM EFF /)的提取方法。在该方法中,L / sub eff /通过栅极偏置的线性外推的栅极偏置的L / sub Eff /阈值电压获得。为了清除L / SUM EFF /各种LDD结构的栅极偏置依赖性的差异,通过实验和模拟检查LDD。 L / sub Eff / LDDS对应于冶金长度。结果表明,当使用该方法的L / Sub Eff /获得时,可以合理地表征MOSFET参数。

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