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An low-energy 8T dual-port SRAM for image processor with selective sourceline drive scheme in 28-nm FD-SOI process technology

机译:用于图像处理器的低能量8T双端口SRAM,具有28-NM FD-SOI工艺技术的选择性Sourceline驱动方案

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This paper presents a low-energy and low-voltage 64-kb 8T dual-port image memory in a 28-nm FD-SOI process technology. Our proposed SRAM adopts the selective sourceline drive (SSD) scheme and the consecutive data write technique for improving active energy efficiency at the low voltage. We fabricated a 64-Kb 8T dual-port SRAM in the 28-nm FD-SOI process technology; the test chip exhibits 0.48 V operation and an access time of 135 ns. The energy minimum point is at a supply voltage of 0.56 V and an access time of 35 ns, where 265.0 fJ/cycle in write operation and 389.6 fJ/cycle in read operation are achieved; these factors are 30% and 26% smaller than those in the 8T dual-port SRAM with the conventional selective sourceline control (SSLC) scheme, respectively.
机译:本文介绍了28纳米FD-SOI工艺技术中的低能量和低压64-KB 8T双端口图像存储器。我们所提出的SRAM采用选择性Sourceline驱动器(SSD)方案和连续数据写入技术,用于提高低电压下的主动能效。我们在28-NM FD-SOI工艺技术中制造了64千桶8T双端口SRAM;测试芯片表现出0.48 V操作和135ns的访问时间。能量最小点处于0.56 V的电源电压和35 ns的访问时间,其中写入操作中的265.0fj /循环和389.6 fj /循环在读取操作中;这些因素分别比8T双端口SRAM中的30%和26%,分别具有传统选择性酶控制(SSLC)方案。

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