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An low-energy 8T dual-port SRAM for image processor with selective sourceline drive scheme in 28-nm FD-SOI process technology

机译:用于图像处理器的低能耗8T双端口SRAM,采用28nm FD-SOI工艺技术中的选择性源极驱动方案

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This paper presents a low-energy and low-voltage 64-kb 8T dual-port image memory in a 28-nm FD-SOI process technology. Our proposed SRAM adopts the selective sourceline drive (SSD) scheme and the consecutive data write technique for improving active energy efficiency at the low voltage. We fabricated a 64-Kb 8T dual-port SRAM in the 28-nm FD-SOI process technology; the test chip exhibits 0.48 V operation and an access time of 135 ns. The energy minimum point is at a supply voltage of 0.56 V and an access time of 35 ns, where 265.0 fJ/cycle in write operation and 389.6 fJ/cycle in read operation are achieved; these factors are 30% and 26% smaller than those in the 8T dual-port SRAM with the conventional selective sourceline control (SSLC) scheme, respectively.
机译:本文提出了一种采用28nm FD-SOI工艺技术的低能耗,低电压的64kb 8T双端口图像存储器。我们提出的SRAM采用选择性源极线驱动(SSD)方案和连续数据写入技术,以提高低电压时的有功电能效率。我们使用28纳米FD-SOI工艺技术制造了64-Kb 8T双端口SRAM。测试芯片的工作电压为0.48 V,访问时间为135 ns。能量最小点是在电源电压为0.56 V且访问时间为35 ns时,在写入操作中达到265.0 fJ /周,在读取操作中达到389.6 fJ /周;与采用传统选择性源极线控制(SSLC)方案的8T双端口SRAM相比,这些因素分别减小了30%和26%。

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