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Characterization of wet chemical etching for effective backside sample preparation on devices with exposed pads

机译:湿化化学蚀刻对曝光垫装置有效背面样品制备的特征

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With the growing complexity of Integrated Circuit (IC) design having multiple metallization layers and copper wire bonded devices, most of the time backside fault isolation is a better approach. This paper evaluated wet chemical backside sample preparation as an alternative method for the traditional milling/polishing backside sample preparation.
机译:随着集成电路(IC)设计的增长复杂性具有多个金属化层和铜线键合装置,大部分时间后部故障隔离是更好的方法。本文评估了湿化学背面样品制备作为传统铣削/抛光背面样品制备的替代方法。

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