copper compounds; epitaxial layers; island structure; nanofabrication; nanowires; self-assembly; vacuum deposition; vapour phase epitaxial growth; Cu deposition parameters; Cusub3/subSi; Si; Si(110) substrates; 110 surface step directions; applied electric field direction; copper silicide; growth parameters; metal silicide nanowires; nanoisland structures; nanowire structures; perpendicular orientation samples; reactive deposition epitaxy; surface step assisted nanowire growth; surface step orientation; Electric fields; Nanostructures; Self-assembly; Silicides; Silicon; Substrates; Surface treatment; Copper; Nanowire; Self-Assembly; Silicide;
机译:稀氮化物GaN
机译:<![CDATA [CAN CH
机译:Al
机译:电场和表面步骤辅助Cu
机译:等离子辅助分子束外延法制备无催化剂的Ⅲ族氮化物纳米线:生长,表征和应用
机译:通过Au辅助分子束外延生长后的GaAs(111)纳米线和Si(111)衬底之间的晶格参数调节
机译:YB $ LT的界面结构和电气特性; INF $ GT; 0.3 $ LT; / INF $ GT; CO $ LT; INF $ GT; 4 $ LT; / INF $ GT; SB $ LT; INF $ GT; 12 $ LT; / INF $ GT; / MO-Cu元素通过焊接使用Ag-Cu-Zn焊料制备