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Compact modeling and electro-thermal simulation of hot carriers effect in analog circuits

机译:模拟电路中热载流子效应的紧凑建模和电热模拟

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A new electro-thermal compact model of MOSFET that takes the channel hot carriers (CHC) effects on the transistor performances into account, including degradation and recovery, is proposed in this paper. The new model deals with the mobility degradation as well as the threshold voltage drift and recovery related to the Si/SiO interface traps density. The substrate current, indicator of the device degradation under CHC is also provided in this model. The model is validated with simulations of a single transistor and at a chip level under various stress conditions. Thanks to our electro-thermal simulation tool and to this model, we can predict circuit degradation and recovery at different electrical and thermal stress conditions.
机译:本文提出了一种新的MOSFET电热紧凑模型,该模型考虑了沟道热载流子(CHC)对晶体管性能的影响,包括退化和恢复。新模型处理迁移率降低以及与Si / SiO界面陷阱密度相关的阈值电压漂移和恢复。该模型还提供了衬底电流,该衬底电流是CHC下器件性能下降的指标。该模型通过在不同应力条件下的单个晶体管仿真和芯片级仿真进行了验证。借助我们的电热仿真工具和此模型,我们可以预测在不同电和热应力条件下的电路退化和恢复。

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