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Thermal characterisation of AlGaN/GaN HEMT on silicon carbide substrate for high frequency application

机译:用于高频应用的碳化硅衬底上AlGaN / GaN HEMT的热特性

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Temperature effect modelling and analysis have been carried out on 0.25 μm gate length AlGaN/GaN HEMT grown on SiC substrate over the temperature range from - 40 to 150°C by on-wafer S-parameter measurements up to 50 GHz. The temperature behaviour of the DC and equivalent circuit parameters including f and f were analyzed. The results provide some valuable insights for future design optimizations of advanced GaN based MMICs.
机译:通过在硅片上生长的0.25μm栅长AlGaN / GaN HEMT,在40至150°C的温度范围内,通过高达50 GHz的晶片上S参数测量,进行了温度效应建模和分析。分析了直流电的温度行为以及包括f和f的等效电路参数。研究结果为先进的基于GaN的MMIC的未来设计优化提供了一些有价值的见解。

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