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Researches on stability of microfocus electron-impact X-ray source

机译:微焦型电子冲击X射线源的稳定性研究

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A microfocus electron-impact X-ray source with micro-beam was introduced in this paper. The tungsten cathode electro-gun is used as emitting system, and the focusing system is consists of two magnetic solenoid lenses, it is effective, light and handy. The matching problems between emitting system focusing system are studied on the microfocus X-ray source. The current of the first focusing lens and the second focusing lens is 0.8A and 1.64A at the voltage of 90kV respectively, and the filament current is 2.5A. Under the condition, the micro-beam spot X-ray is gained. The test results of stability showed that the X-ray source have a excellent stability, X-ray intensity of which is 110.6±0.03μSr/hr, target current of which is 185.5±1.5μA, and the target temperature of which is 96.5±0.5°C.The resolution of micro-focus X-ray source is about 4μm by the analysis of JIMA, which meet the application requirement of microfocus X-ray source.
机译:本文介绍了具有微梁的微孔电壳电子撞击X射线源。钨阴极电枪用作发射系统,聚焦系统由两个磁电磁镜镜片组成,它是有效的,轻巧和方便的。微孔X射线源研究了发光系统聚焦系统之间的匹配问题。第一聚焦透镜和第二聚焦镜头的电流分别在90kV的电压下为0.8A和1.64A,并且丝电流为2.5A。在该条件下,获得了微束点X射线。稳定性的测试结果表明,X射线源具有出色的稳定性,其X射线强度为110.6±0.03μsr/ hr,目标电流为185.5±1.5μA,其目标温度为96.5± 0.5°C。微焦X射线源的分辨率通过JIMA分析约4μm,符合微焦焦X射线源的应用要求。

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