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Flip chip assembly method employing differential heating/cooling for large dies with coreless substrates

机译:带有无芯基板的大型裸片采用差异加热/冷却的倒装芯片组装方法

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In this work, differential heating/cooling chip join process was developed for coreless flip chip packaging to minimize warpage change of coreless substrates during the bonding process. A chip was vacuumed to a bonder head and a coreless substrate was vacuumed on a base plate and they were held at different elevated temperatures during the bonding process. The temperature difference provides a substantially matched thermal expansion between the silicon chip and the coreless substrate. This minimizes stress induced by low coefficient of thermal expansion (CTE) mismatch during flip chip assembly. Both thermal and mechanical modeling were performed to provide more detailed information about the temperature distributions and warpage levels for all package components during the chip join process. Mechanical modeling of the chip join process confirmed that by implementing differential heating/cooling chip join process the stresses within the solder bumps can be reduced by more than 20% and the stresses in the low-k layers within the chip can be reduced by more than 25%. Our evaluations used semiconductor chips with a known low-k dielectric and SnAg solder bumps. The size of the test chip was approximately 19 mm × 19 mm with less than 150 μm pitch. The coreless substrate was 55 mm × 55 mm with 8+1 layers. The samples were bonded with an optimized differential heating/cooling chip join process. The experimental results showed that there were no C4 (Controlled Collapsible Chip Connection) bumps bridging, non-wets, nor low-k delamination in the large die with coreless package. Reliability data showed no failures in any of the tested modules.
机译:在这项工作中,开发了用于无芯倒装芯片封装的差分加热/冷却芯片接合工艺,以最大程度地减小接合过程中无芯基板的翘曲变化。将芯片抽真空到焊头,将无芯基板抽真空到基板上,并在粘结过程中将它们保持在不同的高温下。温度差在硅芯片和无芯基板之间提供了基本匹配的热膨胀。这样可以最大程度地减小倒装芯片组装过程中低热膨胀系数(CTE)不匹配引起的应力。进行了热建模和机械建模,以提供有关芯片接合过程中所有封装组件的温度分布和翘曲水平的更详细的信息。芯片接合过程的机械模型证实,通过实施差分加热/冷却芯片接合过程,可以将焊料凸块内的应力降低20%以上,并且可以将芯片内低k层的应力降低超过20%。 25%。我们的评估使用了具有低k介电常数和SnAg焊料凸点的半导体芯片。测试芯片的尺寸约为19 mm×19 mm,间距小于150μm。无芯基板为55毫米×55毫米,具有8 + 1层。样品通过优化的差动加热/冷却芯片连接工艺进行粘合。实验结果表明,在无芯封装的大裸片中,没有C4(可控制的可折叠芯片连接)凸块桥接,无湿润或低k分层。可靠性数据显示,任何经过测试的模块均未发生故障。

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