Two-Photon-Lithography Substrate Reflection and Absorption Compensation for Additive Manufacturing of Metamaterials on MEMS

摘要

Structuring polymers on micro-electro-mechanical-systems (MEMS) for the manufacturing of acoustical and optical metamaterials using the two-photon polymerization process depends on reliable and controllable regulation of the intensity. Reflecting surfaces, diffracting elements and structures with poor heat dissipation can be problematic obstacles for the incident focused and pulsed laser beam. Thermal and optical simulations were performed and compared to test structures. A compensated fabrication approach was successfully applied to create optimized conditions in the polymerized volume.