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Characterization by GISAXS and Electrochemical Impedance Spectroscopy of porous oxide films

机译:多孔氧化物膜的吉萨斯和电化学阻抗光谱的特征

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Porous oxide films were deposited by reactive sputtering. Some films received UV cures and/or a Si cap. The FTIR analyses show that the deposited films were very hydrophilic. Standard ellipsometric porosimetry was not able to determine porosity nor pore size. With GISAXS, the porosity of different films was determined (approximately 13%) and the pore format (mostly spherical pores with a radius of approximately 5 nm). Electrochemical Impedance Spectroscopy completed the pore analysis, indicating mostly open porosity. These techniques were sufficiently sensitive to show that the Si cap closed the pores somewhat while the UV cure increased the porosity.
机译:通过反应性溅射沉积多孔氧化物膜。一些胶片接受UV固化和/或Si帽。 FTIR分析表明沉积的薄膜非常亲水。标准椭圆孔隙孔瘤率不能测定孔隙率也不能测定孔隙率。利用吉度,测定不同膜的孔隙率(约13%)和孔格(主要是半径约为5nm的球形孔)。电化学阻抗光谱完成完成孔隙分析,表明主要是开放的孔隙率。这些技术足够敏感,表明Si帽在紫外线固化增加孔隙率时稍微闭合孔隙。

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