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Enhanced Field Emission Characteristics of Novel ZnO Multipod Nanostructures

机译:增强新型ZnO多端纳米结构的场发射特性

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Zinc oxide (ZnO), a wide band gap semiconductor has been widely exploited for its application in field emission based devices. It offers various advantages like strong excitonic binding energy (60meV), negative electron affinity, and high mechanical strength making it a good candidate for field emitter arrays of flat panel display devices. However, most of the reports in literature deal with the field emission studies carried out in close proximity geometry, subject to a narrow range of applied voltage. Such type of experimental arrangement forbids the measurement at relatively higher field, as it may lead to an arc formation. The study of the field emission characteristics over a wide applied field range is critical to understand the physics at low dimensions. Moreover, the reason for the higher field enhancement and the appropriate relation of the geometry with the field emission characteristics is important and desirable. Accordingly, we have studied the field emission properties of various ZnO structures in both the configuration to elucidate the relation between morphology and geometry of emitter on the field emission behavior.
机译:氧化锌(ZnO),宽带隙半导体已被广泛利用其在基于场发射的设备中的应用。它提供了强大的激发器绑定能量(60mev),负电子亲和力和高机械强度等各种优点,使其成为平板显示装置的场发射极阵列的良好候选者。然而,文献中的大多数报告处理了在近距离几何形状中进行的场发射研究,受窄范围的施加电压。这种类型的实验布置禁止在相对较高的场处的测量,因为它可能导致弧形形成。在宽施加的场范围内的场发射特性研究对于理解低维度的物理来说至关重要。此外,具有较高场增强的原因和具有场发射特性的几何形状的适当关系是重要的和理想的。因此,我们已经研究了在配置中的各种ZnO结构的场排放特性,以阐明发射器在场发射行为上的形态和几何形状之间的关系。

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