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IRON DOPING BEHAVIOUR IN INP GROWN BY LP-MOVPE IN THE PRESENCE OF TERTIARYBUTYLCHLORIDE

机译:在叔丁基氯化丁基氯化物存在下LP-MOVPE在INP中的铁掺杂行为

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Aiming at selective regrowth, the effect of Tertiarybutylchloride (TBCl) on the electrical properties of LP-MOVPE grown Fe-doped InP layers was investigated in dependence of growth temperature and pressure, which varied from 635°C to 700°C and 20 mbar to 100 mbar, respectively. Fe-doping variation from 2·10{sup}16 cm{sup}(-3) to 1·10{sup}17 cm{sup}(-3) resulted in resistivity values in the 10{sup}8 Ωcm range. In the case of TBCl addition, enhanced Fe-incorporation was observed, however, resistivity remained in the same range. Thus, TBCl may be applied for morphology improvement without compromising the semi-insulating behaviour of the InP:Fe material.
机译:旨在选择性再生,研究叔丁基氯化丁(TBCL)对LP-MOVPE生长的Fe掺杂的INP层的电性能的影响,依赖于生长温度和压力,从635℃变化至700°C和20毫巴分别为100毫巴。 Fe-Doping变型从2·10 {sup} 16cm {sup}( - 3)到1·10 {sup} 17cm {sup}( - 3)导致10 {sup}8Ωcm范围内的电阻率值。在TBCL添加的情况下,观察到增强的Fe掺入,然而,电阻率保持在相同范围内。因此,TBCL可以应用于形态改善,而不会影响INP:Fe材料的半绝缘行为。

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