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Accelerate high speed IO design closure with distributed chip IO interconnect model

机译:通过分布式芯片IO互连模型加速高速IO设计闭合

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This paper presents an overview of the applications of the distributed models representing chip IO power, ground and signal distribution systems from IO cells to die bumps. It provides a methodology of applying such models for on-die electrical performance assessment of IO power, ground and signal interconnects. It also demonstrates the die-to-die system-level IO SSO analysis with the chip interconnect model together with other models. The conventional chip interconnect model extraction tools are designed either for STA (static timing analysis) or for voltage drop analysis. In the former, the extraction tools mainly focus on RC (resistance and capacitance) extraction of signal traces but are neither keen to power rail network nor the couplings between power rails and signals. In the later, the tools extract the power rail network RC only by completely ignoring the signal parasitics. In both cases, the size of parasitic netlists including chip power and ground networks could be too large to be simulated. As a result, chip engineers have to guard their designs with a large amount of safety margin and leave the final signal integrity verification and fixes to the system engineers. On the other hand, the system engineers often have to either omit the chip IO interconnect model completely by connecting IO buffers with the package model directly or include a very simplified lumped on-chip power/ground model across all the driver power and ground terminals. Hence, the system-level SSO simulation results become either unduly pessimistic or over optimistic. A breakthrough extraction technology which generates a detailed model of chip IO power, ground and signal interconnects from bumps to IO circuits that fully represent the distributed nature of power, ground and signals as well as their electromagnetic coupling effects has been introduced by Cadence, which fills the gap between EDA tools and chip design needs for accurate on-die and system-level analysis of high-speed cha- nels and buses. The newly introduced chip IO interconnect model extraction takes chip layout data in GDSII or LEF/DEF formats, as well as the technology file for stackup process parameters and a user-specified configuration for net names, circuit definitions, etc. and then generates a comprehensive SPICE netlist that consists of a fully distributed IO power, ground and signal connections from IO cells to die bumps, including RDL and all the other metal layers, and bumps/ubumps. It accounts for all inductive and capacitive couplings between power, ground and signals on the chip. This extraction method offers both high spatial resolution and compact circuit size to ensure accuracy and efficiency. There is no practical limitation on the number of external nodes of the SPICE circuit netlist. By default, it generates a distinct external node for each die bump connected to off-chip structures and each pin connected to IO cells. An option is provided for a user to group bumps by region for accuracy and performance/capacity trade-off. The on-die interconnect model thus extracted enables a quick assessment of on-chip power and ground quality along with signal performance at every IO cell. Intuitive graphical representation of the electrical performance at each cell and query functions help designers easily verify each IO channel characteristics, quickly identify weak or problematic physical areas and perform what-if analysis to rapidly improve the design. Once the design meets the chip-level specification, the SI engineers can assemble the chip IO power, ground and signal interconnect model with other off-chip models through Cadence Model Connection Protocol (MCP) interface and perform the system-level IO SSO simulation. A typical die-to-die IO SSO simulation for a DDR memory interface, which includes power-aware IBIS (Input Output Buffer Information Specification) models for drivers and receivers, and distributed and coupled power/ground/signal models for chip, package and
机译:本文概述了代表芯片IO电源,地面和信号分配系统的分布式模型的应用,从IO细胞达到颠簸。它提供了应用此类模型的IO电源,地和信号互连的模具电气性能评估的方法。它还通过芯片互连模型与其他模型一起演示了模具到模具级IO SSO分析。传统的芯片互连模型提取工具用于STA(静态定时分析)或用于电压降分析。在前者中,提取工具主要专注于信号迹线的RC(电阻和电容),但既不牢牢到电源轨网络,也不是电源轨和信号之间的耦合。在后面,该工具仅通过完全忽略信号寄生剂来提取电源轨道网络RC。在这两种情况下,包括芯片功率和地面网络在内的寄生网师的大小可以太大而无法模拟。因此,芯片工程师必须以大量的安全保证金保护其设计,并将最终信号完整性验证和修复到系统工程师。在另一方面,该系统工程师通常必须要么省略芯片IO互连模型完全由与封装模型直接连接IO缓冲器或包括所有驱动器电源端子和接地端子非常简化集总片上的电源/接地模型。因此,系统级SSO仿真结果变得过度悲观或过度乐观。一种突破性的提取技术,它产生从凸起到IO电路的芯片IO电源,地面和信号互连的详细的提取技术,这些折叠到IO电路完全代表了电源,地和信号的分布性质以及它们的电磁耦合效果填充EDA工具与芯片设计之间的差距以及高速混沌和公共汽车的准确芯片和系统级别分析。新引进的芯片IO互连模型提取以GDSII或LEF / DEF格式采用芯片布局数据,以及堆叠过程参数的技术文件以及用于网络名称,电路定义等的用户指定配置,然后生成全面Spice网表由IO细胞的完全分布式的IO电源,地面和信号连接组成,以将凸块(包括RDL和所有其他金属层)和凸起/ ubumps。它会考虑芯片上的电源,地面和信号之间的所有电感和电容耦合。该提取方法提供高空间分辨率和紧凑的电路尺寸,以确保精度和效率。对香料电路网列表的外部节点数量没有实际限制。默认情况下,它为连接到片外结构的每个芯片凸块和连接到IO细胞的每个引脚产生不同的外部节点。为用户提供一个选项,以便按区域进行凹凸,以获得精度和性能/容量权衡。如此提取的模具互连模型可以快速评估片上功率和地面质量以及每个IO单元的信号性能。在每个单元格和查询功能的直观图形表示帮助设计人员容易验证每个IO通道特性,快速识别弱或有问题的物理区域,并执行什么分析以便快速改进设计。一旦设计符合芯片级规范,SI工程师可以通过Cadence模型连接协议(MCP)接口与其他片外模型组装芯片IO电源,接地和信号互连模型,并执行系统级IO SSO模拟。 DDR存储器接口的典型模具模具IO SSO模拟,包括用于驱动器和接收器的电源感知IBIS(输入输出缓冲区信息规范)模型,以及用于芯片,包装的分布式和耦合电源/地/信号模型

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