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High and low-field contact resistances in trigate devices in a Non-Equilibrium Green's Functions framework

机译:在非平衡绿色功能框架中的粗曲器件中的高和低场接触电阻

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We compute the contact resistances at low drain bias in Trigate and FinFET devices with widths and heights in the 4 to 24 nm range, using a Non-Equilibrium Green's Function approach. Electron-phonon, surface roughness and Coulomb scattering are taken into account. The analysis of the quasi-Fermi level profile reveals that the areas under the spacers are major contributors to the contact resistance at low field, due to the poor electrostatic control over the carrier density under the spacers. The impact of design parameters (cross-section and doping profile) on the contact resistance is analyzed and the simulations are compared to experimental data. At high drain bias, the contributions of phonons and impurities scattering in the source and drain are also computed and discussed.
机译:我们使用非平衡绿色的功能方法计算宽度和高度的宽度和高度的宽度和高度的宽度和高度的接触电阻。考虑电子 - 声子,表面粗糙度和库仑散射。对准费米水平型材的分析表明,间隔件下的区域是低场接触电阻的主要贡献者,由于在间隔物下的载体密度较差。分析了设计参数(横截面和掺杂型材)对接触电阻的影响,并将模拟与实验数据进行比较。在高漏极偏压下,还计算并讨论了源极和漏极散射的声子和杂质的贡献。

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