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A Novel Diode-Clamped Carrier-Stored SOI Lateral Superjunction IGBT with Ultralow Turn-off Loss and Saturation Current

机译:一种新型二极管夹紧的载体储存的SOI横向超级超结,具有超级关闭损耗和饱和电流

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A novel diode-clamped carrier-stored SOI lateral superjunction IGBT is proposed and investigated by numerical simulations. The propose LIGBT remarkably features a carrier stored layer (n-CS) beneath the p-base region, an superjunction (SJ) layer in the drift region, a p-shield region connected to the cathode electrode through two integrated series diodes via floating ohmic contact (FOC) and a trench oxide embedded between the p+ and n+ anode. The heavily doping n-CS layer can effectively reduce the on-state voltage ($V_{ext{ON}}$), and the p-shield region eliminates the impact on the breakdown voltage (BV) from the high doping of the n-CS (Ncs). In addition, the connection between the integrated series diodes and the p-shield region can help to achieve a quite low saturation current. Finally, the proposed CSTBT can realized an ultralow $E_{ext{off}}$ thanks to the rapid extraction of the excess carriers by the SJ layer. The simulation results indicate that, at the same $V_{ext{ON}}, E_{ext{off}}$ of the proposed LTIGBT is 90% and 97% lower than those of the conventional LIGBT (LIGBT-1) and the separated shorted-anode LIGBT (LIGBT-2), respectively.
机译:一种新颖的二极管钳位载体存储的SOI横向超结IGBT提出并通过数值模拟研究。该提议LIGBT显着特点是p基区下方的载流子存储层(n-CS),在漂移区域中的超结(SJ)层,经由浮动欧姆通过两个集成的串联二极管连接到所述阴极电极的p屏蔽区接触(FOC)和嵌入在所述p +和n +阳极之间的沟槽氧化物。重掺杂n CS层可有效地降低通态电压( $ V _ {文本{ON }} $ ),以及p屏蔽区域消除了从n-CS(NCS)的高掺杂的击穿电压(BV)的影响。此外,集成的串联二极管和p-屏蔽区域之间的连接可以帮助实现相当低的饱和电流。最后,建议CSTBT可以实现超低 $ E _ {文本{关}} $ 由于由SJ层的过剩载流子的快速提取。仿真结果表明,在相同的 $ V _ {文本{ON }},E _ {文本{关闭}} $ 所提出的LTIGBT是90%和97%比常规LIGBT(LIGBT-1)和短接阳极LIGBT分别(LIGBT-2),所分离的降低。

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