首页> 外文会议>IEEE Nanotechnology Materials and Devices Conference >Preparation, growth mechanism and chemical compositional analysis of nanocrystalline Sb2(S1#x2212;x ,SEx)3 thin films using arrested precipitation technique (APT)
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Preparation, growth mechanism and chemical compositional analysis of nanocrystalline Sb2(S1#x2212;x ,SEx)3 thin films using arrested precipitation technique (APT)

机译:纳米晶体的制备,生长机理和化学成分分析Sb 2 (S 1-X / INF>,SE X-IM>) 3 使用被捕沉淀技术(APT)的薄膜

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Combinational thin films of antimony sulphoselenide [Sb2(S1−xSex)3] have been synthesized on a good quality glass substrates using newly developed arrested precipitation technique (APT) by us. Sb(III) ions were arrested using aqueous alkaline solution of organic complexing agent. Highly reflecting uniform and tightly adhesive thin films were formed by optimizing various preparative conditions such as concentration, temperature, pH and rate of agitation on to a amorphous glass substrates. For the first time antimony chalcogenide films were analysed using 4’ bromo PTPT reagent by spectrophotometric and atomic absorption spectroscopic (AAS) technique. Statistical assessment of the results show the formation of combinatorial thin films of Sb2S3 with Sb2Se3 which confirm the general formula [Sb2(S1−xSex)3]. A band gap of combinatorial phase of [Sb2(S0.5Se0.5){in3] 1.65 eV is obtained from electrical and optical studies. From the electrical measurement an activation energy of 0.8 eV is obtained in the temperature range 273–475 K. Optical absorption studies show that transitions are direct and allowed ones.
机译:合并氧化致氧化膜[Sb 2 (S 1-X / INM> SE x 3 ]已经合成在使用新开发的被捕的降水技术(APT)的优质玻璃基板上。使用有机络合剂的碱性溶液被捕获Sb(III)离子。通过优化各种制备条件,例如浓度,温度,pH和搅拌速率对非晶玻璃基板来形成高度反射均匀和紧密的粘合薄膜。对于第一次通过分光光度法和原子吸收光谱(AAS)技术使用4'BROMO PTPT试剂分析锑的硫属化物膜。结果统计评估表明,使用Sb 2 SE 3 的组合薄膜的组合薄膜的形成。确认通式[SB 2 (S 1-X / INM> SE X 3 ]。 [Sb 2 (S 0.5 SE 0.5 ){IN3 ] 1.65eV的带隙是从电气中获得的和光学研究。从电气测量,在273-475k的温度范围内获得0.8eV的激活能量显示,光学吸收研究表明过渡是直接和允许的。

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