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Effect of Zn doping on structural and ferroelectric properties of GaFeO3for futuristic spintronic applications

机译:Zn掺杂对GafeoO 3 用于未来派旋转型应用的影响

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In this paper, we have studied the effect of Zn doping on the structure, micro-structure and ferroelectric properties of GaFeO3. The syntheses of the samples were done using sol-gel technique. The X-ray diffraction (XRD) studies show the orthorhombic structure having space group Pc21n without any secondary phase or impurity, suggesting no change in structure due to the incorporation of Zn. The refined lattice parameters and unit cell volume increase upon Zn doping. Room temperature Raman spectroscopy data confirmed the incorporation of Zn in GaFeO3. Scanning electron microscope (SEM) images show the irregular shape of grains with average particle size of 0.9 μm and energy dispersive X-ray analysis (EDX) verified the composition of the compound. Further, the reduction in leakage current was observed upon Zn doping in GaFeO3, resulting in a more in ferroelectric behaviour.
机译:在本文中,我们研究了Zn掺杂对Gafeo的结构,微结构和铁电性能的影响 3 。使用溶胶 - 凝胶技术进行样品的合成。 X射线衍射(XRD)研究表明,在没有任何二次相或杂质的情况下具有空间组PC21N的正交结构,表明由于锌的掺入而没有结构变化。 Zn掺杂时,精制的晶格参数和单位细胞体积增加。室温拉曼光谱数据证实了Zn在Gafeo的结合 3 。扫描电子显微镜(SEM)图像显示出平均粒度为0.9μm的不规则形状,并且能量分散X射线分析(EDX)验证了化合物的组成。此外,在GAFEO Zn掺杂时观察到漏电流的降低 3 ,导致铁电行为更多。

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