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Fabrication and characterization of 100-nm wide silicon nanocantilevers using top-down approach

机译:使用自上而下方法制备和表征100nm宽硅纳米膜膜的制造与表征

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We present fabrication and characterization of silicon nanocantilevers as nano electromechanical systems (NEMS). We fabricated silicon nanocantilever using silicon on insulator (SOI) wafer by employing stepper UV lithography, which permits resolution of 100 nm. The nanocantilevers were driven by electrostatic force with approaching tungsten tip inside a scanning electron microscope (SEM). Both lateral and vertical resonance frequencies were visually detected with the SEM and compared with analytical results.
机译:我们呈现硅纳米膜的制造和表征作为纳米机电系统(NEMS)。我们通过采用步进UV光刻在绝缘体(SOI)晶片上制造了硅纳米膜膜,其允许分辨率为100nm。纳米膜膜通过静电力驱动,在扫描电子显微镜(SEM)内接近钨尖端。用SEM目视检测横向和垂直共振频率,并与分析结果进行比较。

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