Metalcones: Hybrid Organic-Inorganic Films Fabricated Using Atomic and Molecular Layer Deposition Techniques

摘要

A new class of thin films can be grown using atomic layer deposition (ALD) and molecular layer deposition (MLD) techniques. These films are hybrid organic-inorganic materials derived from the sequential, self-limiting surface reactions of metal and organic precursors. One class of these materials are the "metalcones" that are metal alkoxides. The first metalcones were the "alucones" grown using trimethylaluminum (TMA) and organic diols and triols such as ethylene glycol (EG) and glycerol (GL). Additional metalcones are the "zincones" deposited using diethylzinc (DEZ) and EG or hydroquinone (HQ), and the "titanicones" grown using titanium tetrachloride (TiCl_4) and EG or GL. Alloy films can also be deposited by combining metalcone MLD and metal oxide ALD. This paper describes the growth of Al_2O_3 ALD and alucone MLD alloy films and their tunable properties. Alloy films of ZnO ALD and zincone MLD will also be discussed that form conducting and transparent films. In addition, the growth of titanicone MLD films will be examined as well as the post-processing of these films using annealing and UV light. The metalcones and their alloys can be grown with atomic control of thickness and excellent conformality. These new materials provide a tool set for engineering the functional properties of thin films.