Characterization of ion beam current distribution influences on nanomachining

摘要

The requirements for focused ion beam (FIB) systems to provide higher image resolution and machining precision continue to increase with the continuation of Moore's Law. Due to the shrinking geometry and increasing complex structures and materials, it is ever more critical to scale the entire ion probe. The necessity for comprehensive analysis of the ion beam profile and understanding how the ion beam current distribution profile influences different aspects of nanomachining are becoming increasingly important and more challenging.