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Effect of Indium Bromide Treatments Post-Deposition Recrystallization Temperature on Cu(In,Ga)Se2 Thin Films

机译:溴化铟处理对Cu(Ga)Se2薄膜沉积后重结晶温度的影响

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Cu(In,Ga)Se2 samples were deposited onto molybdenum back contact at low temperature using thermal evaporation. Recrystallization was then performed at 400 °C using indium bromide vapor treatment for one hour. The treatment developed change in morphology with improved grain size and increased crystallinity. Variation in composition profile was observed, enhancing the In content while decreasing the Ga content. No apparent phase separation was observed from XRD but preferential orientation along (204) were induced.
机译:Cu(在,ga)se 2 使用热蒸发在低温下将样品沉积在钼后接触上。 然后使用溴化铟蒸气处理在400℃下再重结晶一小时。 该治疗发生了改善晶粒尺寸和结晶度增加的形态变化。 观察到成分谱的变异,同时降低GA含量的同时增强内容。 从XRD观察到没有表观相分离,但诱导沿(204)的优先取向。

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