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Coating Method of ZnS Layer for InP Quantum Dot by Solvothermal Method

机译:溶剂热法InP量子点ZnS层的涂覆方法

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摘要

A ZnS layer was coated around InP quantum dot (QD) by a solvothermal process. The photoluminescence (PL) quantum yield was improved by optimizing the annealing temperature, and the highest value was 42.2%. In addition, emission peak was changed from 532 nm to 629 nm by a size-sorting process.
机译:通过溶剂热工艺在InP量子点(QD)周围涂覆ZnS层。通过优化退火温度可以提高光致发光(PL)量子产率,最高值为42.2%。另外,发射峰通过尺寸分选过程从532nm改变为629nm。

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