Spatial Distribution of Properties of a-IGZO Films Deposited by Rotation Magnet Sputtering Incorporating Dual Target Structure

摘要

A new magnetron sputtering equipment called rotation magnet sputtering incorporating dual planar target structure was developed to obtain high target utilizatbn and wide high-quality-film-deposition region by moving multiple plasma loops. This new system was applied to a-IGZO film depositions. Spatial distributions of film properties were investigated.