SPUTTERING TARGET FOR DEPOSITING LIGHT SHIELDING FILM FOR BLACK MATRIX AND LIGHT SHIELDING FILM DEPOSITED BY USING THE SPUTTERING TARGET

摘要

PROBLEM TO BE SOLVED: To provide a sputtering target for depositing a light shielding film for a black matrix so as to be laminated in the process of producing a color pannel of a liquid crystal display or the like, and to provide a light shielding film deposited by using the sputtering target.;SOLUTION: The sputtering target consists of (a) an Ni based alloy having a composition combinedly containing 10 to 30% Mo and 1 to 10% Ta, and the balance Ni with inevitable impurities, or (b) an Ni based alloy having a composition in which one or more kinds selected from 0.5 to 6% Nb, 1 to 5% Ti and 1 to 5% Fe are further added to the above Ni based alloy, or (c) an Ni based alloy having a composition in which one or two kinds of Cu and V are combinedly added by 1 to 10% in total to the Ni based alloy described in the above (a) or (b). The light shielding film is deposited by using those sputtering targets.;COPYRIGHT: (C)2002,JPO