首页> 外文会议>European symposium on computer aided process engineering;ESCAPE 21 >A rigorous mathematical formulation to Automated Wet-Etch Station scheduling with multiple material-handling robots in Semiconductor Manufacturing Systems
【24h】

A rigorous mathematical formulation to Automated Wet-Etch Station scheduling with multiple material-handling robots in Semiconductor Manufacturing Systems

机译:半导体制造系统中使用多个物料搬运机器人对湿式蚀刻站进行自动调度的严格数学公式

获取原文

摘要

Track systems have been increasingly utilized in many different stages in the Semiconductor Industry. Most of the manufacturing processes, particularly those executed in the wafer fabrication, require these transportation devices to perform the transfers of wafers lots through several process steps. Since these process steps only produce one lot at a time in a single bath, the number of transfer operations between consecutive baths increases drastically with the number of steps and lots in the system. Therefore, the problem to be tackled in this work aims at finding the efficient structure and operation strategy of a particular track system working in an Automated Wet-Etch Station (AWS). A rigorous mathematical formulation (MILP) for the simultaneous scheduling and design of the AWS is developed in order to minimize the residence time of wafer lots in the system, providing at the same time a better utilization of track's resources.
机译:轨道系统已在半导体行业的许多不同阶段中得到越来越多的利用。大多数制造工艺,特别是在晶片制造中执行的制造工艺,都需要这些运输设备通过几个工艺步骤来完成晶片批次的转移。由于这些处理步骤一次只能在一个熔池中一次生产一个批次,因此连续熔池之间的转移操作数量会随着系统中步骤和批次的数量而急剧增加。因此,这项工作要解决的问题是寻找在自动湿蚀刻站(AWS)中工作的特定轨道系统的有效结构和操作策略。开发了用于AWS的同时调度和设计的严格数学公式(MILP),以最大程度地减少晶圆批在系统中的停留时间,同时提供对轨道资源的更好利用。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号