INFLUENCE OF THE DEPOSITION PARAMETERS ON THE OPTICAL AND STRUCTURAL PROPERTIES OF CUO THIN FILMS DEPOSITED BY RF SPUTTERING

摘要

In this work, CuO(Ti) and CuO(Ni) thin films were fabricated by depositing CuO doped Ti and CuO doped Ni by reactive RF sputtering on glass substrates using a pure Cu target in an argon-oxygen atmosphere. The films were prepared under different O2 partial pressures (10%, 20%, 30% and 50%). In addition, the doping was also varied to evaluate the influences of these parameters on the structural, photovoltaic and optical properties of the obtained films by X-ray diffraction and UV-VIS spectroscopy.