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USE OF ARGON SPUTTERING TO MODIFY SURFACE PROPERTIES BY THIN FILM DEPOSITION
USE OF ARGON SPUTTERING TO MODIFY SURFACE PROPERTIES BY THIN FILM DEPOSITION
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机译:使用氩溅射通过薄膜沉积来修饰表面特性
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摘要
A method is provided for selectively depositing nonreactive materials, such as polyimide polymers, on the vertical sidewalls of a mesa-like structure. The method of the present invention is useful for providing a mesa structure that is modified such that no reactive material flows along the vertical sidewalls of the mesa structure.
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