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In-situ HRTEM Observations of Spreading Reactive Molten Alloy on Ceramic Substrates

机译:在陶瓷基底上扩散反应性熔融合金的原位HRTEM观察

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In-situ HRTEM technique was applied to various substrates and the reaction processes between substrates and molten alloy were compared. Substrates used were SiC, Si_3N_4, Si wafers, an amorphous carbon film, and a carbon nanotube. Ti-containing Ag-Cu eutectic alloy foil was placed on the substrate and the combined specimen mounted on the heating holder of an HRTEM and heated in the microscope to melt the alloy foil. In the case of SiC, Si_3N_4, carbon materials, the molten alloy spreading on the substrates were observed after melting of the alloy. SiC polar plane nano-steps appeared with the SiC dissociation by the molten alloy. On the surface of the carbon nanotube, thin film precursor spreading was observed. In contrast, Si reaction with the molten alloy produced big holes at the contacted area and molten alloy spreading was not observed.
机译:将原位HRTEM技术应用于各种基材,并比较了基材与熔融合金之间的反应过程。所使用的衬底是SiC,Si_3N_4,Si晶片,非晶碳膜和碳纳米管。将含钛的Ag-Cu共晶合金箔放置在基底上,并将合并的样品安装在HRTEM的加热支架上,并在显微镜下加热以熔化合金箔。在SiC,Si_3N_4,碳材料的情况下,在合金熔化之后观察到熔融合金散布在基板上。 SiC极性平面的纳米台阶随着熔融合金的SiC离解而出现。在碳纳米管的表面上,观察到薄膜前体扩散。相反,Si与熔融合金的反应在接触区域产生大的孔,并且未观察到熔融合金的扩散。

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