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Rapid layout pattern classification

机译:快速布局模式分类

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摘要

Printability of layout objects becomes increasingly dependent on neighboring shapes within a larger and larger context window. In this paper, we propose a two-level hotspot pattern classification methodology that examines both central and peripheral patterns. Accuracy and runtime enhancement techniques are proposed, making our detection methodology robust and efficient as a fast physical verification tool that can be applied during early design stages to large-scale designs. We position our method as an approximate detection solution, similar to pattern matching-based tools widely adopted by the industry. In addition, our analyses of classification results reveal that the majority of non-hotspots falsely predicted as hotspots have printed CD barely over the minimum allowable CD threshold. Our method is verified on several 45 nm and 32 nm industrial designs.
机译:布局对象的可打印性越来越依赖于越来越大的上下文窗口中的相邻形状。在本文中,我们提出了一种两级的热点模式分类方法,可以同时检查中心模式和外围模式。提出了准确性和运行时间增强技术,使我们的检测方法既稳健又有效,可以作为快速的物理验证工具,可以在早期设计阶段应用于大规模设计。我们将我们的方法定位为一种近似检测解决方案,类似于业界广泛采用的基于模式匹配的工具。另外,我们对分类结果的分析表明,由于热点仅在CD的最小允许阈值之上印刷了热点,因此大多数非热点都会被错误地预测。我们的方法已在几种45 nm和32 nm工业设计中得到验证。

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