首页> 外文会议>PRICM 7;Pacific Rim International Conference on Advanced Materials and Processing >Preparation of Photoluminescent Silicon Nanowires Based on Multicrystalline Silicon Wafers
【24h】

Preparation of Photoluminescent Silicon Nanowires Based on Multicrystalline Silicon Wafers

机译:基于多晶硅晶片的光致发光硅纳米线的制备

获取原文

摘要

Single crystal silicon (sc-Si) wafers are widely used as the precursors to prepare silicon nanowires (SiNWs) by employing a silver-assisted chemical etching process. In this work, we obtained SiNWs arrays using multicrystalline silicon (mc-Si) wafers. Firstly, silver nanoparticles were deposited on the textured solar-grade mc-Si wafer by a galvanic displacement process; secondly, the SiNWs arrays were formed by a silver-assisted chemical etching process conducted in a HF-H_2O_2 aqueous solution. The etching process indicated that the growth of SiNWs is independent on the orientation of the Si wafer. TEM images showed that the SiNWs have rough and nanoporous structures on the top side along axial directions. The photoluminescence (PL) spectrum of SiNWs showed a broad visible emission centred around 700 nm, which is attributed to the emission properties of silicon nanocrystallites in SiNWs. This work may contribute to the development of SiNWs in application including optoelectronic devices, solar energy conversion devices, chemical sensors, and lithium secondary batteries, etc.
机译:单晶硅(sc-Si)晶片被广泛用作通过采用银辅助化学刻蚀工艺制备硅纳米线(SiNWs)的前体。在这项工作中,我们使用多晶硅(mc-Si)晶片获得了SiNWs阵列。首先,通过电流置换法将银纳米颗粒沉积在纹理化的太阳能级mc-Si晶圆上;其次,通过在HF-H_2O_2水溶液中进行银辅助化学刻蚀工艺形成SiNWs阵列。蚀刻过程表明,SiNWs的生长与Si晶片的方向无关。 TEM图像显示,SiNW在轴向上侧具有粗糙且纳米多孔的结构。 SiNWs的光致发光(PL)光谱显示出一个以700 nm为中心的宽可见光发射,这归因于SiNWs中硅纳米微晶的发射特性。这项工作可能有助于在应用中开发SiNW,包括光电器件,太阳能转换器件,化学传感器和锂二次电池等。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号